6.
Bulletin MRS (Materials Research Society)
Fabrication of sub-45 nm structures for the next generation of devices.
Vol. 30, n˚ 12, déc. 2005.
RONSE (K.)
Optical lithography – a historical perspective.
C. R. Physique, doi : 10.1016/j.chry.2006.10.007 (2006).
SWITKES (M.)
ROTHSCHILD (M.)
KUNZ (R.R.)
BAEK (S.-Y.)
COLES (D.)
YEUNG (M.)
Immersion lithography : Beyond the 65 nm node with optics.
Microlithography World, p. 4, mai 2003.
COURJON (D.)
Near-field microscopy and near-field optics.
Imperial College Press, Londre (2003).
NOVOTNY (L.)
HECHT (B.)
Principles of Nanooptics....
You do not have access to this resource.
Exclusive to subscribers. 97% yet to be discovered!
Already subscribed?
Log in!
Ongoing reading
References