6.
Bulletin MRS (Materials Research Society)Fabrication of sub-45 nm structures for the next generation of devices.Vol. 30, n˚ 12, déc. 2005.RONSE (K.)Optical lithography – a historical perspective.C. R. Physique, doi : 10.1016/j.chry.2006.10.007 (2006).SWITKES (M.)ROTHSCHILD (M.)KUNZ (R.R.)BAEK (S.-Y.)COLES (D.)YEUNG (M.)Immersion lithography : Beyond the 65 nm node with optics.Microlithography World, p. 4, mai 2003.COURJON (D.)Near-field microscopy and near-field optics.Imperial College Press, Londre (2003).NOVOTNY (L.)HECHT (B.)Principles of Nanooptics.Cambridge Press (2007).LOURTIOZ (J.M.)TCHELNOKOV (A.)Nanophotonique et Micro-Nanotechnologies.Techniques de l'ingénieur. Nanotechnologies
You do not have access to this resource.
Exclusive to subscribers. 97% yet to be discovered!
Already subscribed?
Log in!
Ongoing reading
References