ALD's contribution to water photodissociation
Use of ALD for Water Photosplitting

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RE258 V1 Research and innovation

ALD's contribution to water photodissociation
Use of ALD for Water Photosplitting

Author : Lionel SANTINACCI

Publication date: October 10, 2016 | Lire en français

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2. ALD's contribution to water photodissociation

The main issues concerning photoelectric cells were described in the previous paragraph. While the synthesis of new electrode materials appears to be an option, it is the nanostructuring and functionalization of photoelectrodes that appear to offer the most promising solutions. Thanks to its many advantages over other deposition methods [RE253] , the ALD process is the ideal tool for creating the next generation of photoelectrochemical cells. Indeed, since the early 2010s, ALD has been successfully employed for the synthesis of active or passive films on planar and three-dimensional...

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