ALD process
Atomic Layer Deposition (ALD)

Add to my library

RE253 V1 Archive

ALD process
Atomic Layer Deposition (ALD)

Authors : Nathanaelle SCHNEIDER, Frédérique DONSANTI

Publication date: October 10, 2016 | Lire en français

Add to my library Add to my library

Logo Techniques de l'Ingenieur You do not have access to this resource.
Request your free trial access! Free trial

Already subscribed?

3. ALD process

The ALD process is described here in its entirety, i.e. its key features (ALD cycle, chemical deposition, surface reactions, effect of temperature, number of cycles, program, etc.), as well as its development

You do not have access to this resource.
Logo Techniques de l'Ingenieur

Exclusive to subscribers. 97% yet to be discovered!

You do not have access to this resource. Click here to request your free trial access!

Already subscribed?

Article included in this offer

"Metal treatments"

( 131 articles )

Complete knowledge base

Updated and enriched with articles validated by our scientific committees

Services

A set of exclusive tools to complement the resources

View offer details
Contact us
Contact our team FAQ