ABSTRACT
The use of nano-sources to induce a photostructure transformation of matter in a controlled manner, with a resolution much lower than the wavelength of light, paves the way for a promising approach to nanolithography which uses photons as a writing medium. The targeted applications go well beyond the field of microelectronics since they involve both high-density optical storage and molecular manipulation.
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INTRODUCTION
Exploiting nanosources to photostructure matter in a controlled way with a resolution well below the wavelength of light, opens the way to a promising approach to nanolithography using photons as writing vectors.
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Near-field nanophotolithography
References
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(1) - Bulletin MRS (Materials Research Society) -
Fabrication of sub-45 nm structures for the next generation of devices.
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Vol. 30, n˚ 12, déc. 2005.
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(2) - RONSE (K.) -
Optical lithography – a historical perspective.
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C. R. Physique, doi : 10.1016/j.chry.2006.10.007...
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