Conclusion
High Power Impulse Magnetron Sputtering

Cold plasmas make it possible to obtain a very specific surface area with a small amount of raw material, without using hazardous, toxic, or polluting chemicals. However, they still require the use of vacuum technologies that are restrictive for industrial processes.

First appearing in the 1990s, HiPIMS technology enables the production of highly ionized cold plasmas that promote the synthesis of thin films with new or improved properties. The application of high-power pulses with a low duty cycle prevents excessive heating of the target. Furthermore, by applying short pulses, the discharge is maintained without the appearance of unwanted arcs, which are detrimental to the quality of the growing film. The energy supplied to the ions and electrons in the plasma during short pulses allows denser films to be grown. For example, the microelectronics sector could benefit...