Acronyms
Input of In situ characterisation in atomic layer deposition (ALD) processes.

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Acronyms
Input of In situ characterisation in atomic layer deposition (ALD) processes.

Authors : Jean-Luc DESCHANVRES, Carmen JIMENEZ

Publication date: October 10, 2016 | Lire en français

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5. Acronyms

ALD: Atomic Layer Deposition – Atomic Layer Deposition by alternating flow

ANR: French National Research Agency

DMZ: Dimethylzinc, Zn(CH3)2

DEZ: Diethylzinc, Zn(C2H5)2

DFT: Density Functional Theory –

DMA: Dimethylamine

EMA: effective-medium-approximation – effective-medium-approximation

EXAFS: Extented X-ray Absorption Fine Structure – analysis of fine X-ray absorption oscillations over an extended range

FTIR: Fourier Transform Infrared spectroscopy.

GISAXS: Grazing Incidence Small Angle X-ray Scattering –

GPC: Growth Per Cycle – or growth rate per cycle

ICP: Inductive Coupled Plasma – plasma par couplage inductif

LMGP: Materials and Physical Engineering Laboratory

MOCVD: Metal Organic Chemical Vapor Deposition – Chemical vapor deposition from...

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