Glossary
Thermodynamic Evaluation of ALD Precursors

Atomic Layer Deposition; Dépôt de couches atomiques (ALD)

Ultra-thin film deposition technique based on the use of several gas-phase precursors which are successively brought onto a surface where they react with it, in sequential mode.

Chemical Vapor Deposition; Dépôt chimique en phase vapeur (CVD)

A technique for depositing ultra-thin layers which involves bringing a volatile compound of the material to be deposited into contact either with another gas in the vicinity of the surface to be coated, or with the surface in question, so as to provoke a chemical reaction resulting in at least one solid product.

Mass spectrometry; Spectrométrie de masse (MS)

A sample analysis technique based on the gas-phase separation of charged molecules (ions) according to their mass-to-charge...