3. Modification and synthesis of materials by layout
3.1 Formation of buried metal layers
At high doses, doping ions, implanted in a matrix under appropriate experimental conditions (matrix temperature, ion energy and flux), enable alloy layers to be synthesized at a controlled depth. .
This method is used in particular in silicon to form buried layers of metal silicides by implantation of Ni, Co or Fe. The various stages...
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Modification and synthesis of materials by layout
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