4. Effect of cathode electromagnetic field on plasma properties
It is well known that the properties of thin films are strongly correlated to the energy per deposited atom, as demonstrated by various publications
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Effect of cathode electromagnetic field on plasma properties
Bibliography
Bibliography
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(1) - DEPLA (D.), MAHIEU (S.), DE GRYSE (R.) -
Depositing Aluminium Oxide: A Case Study of Reactive Magnetron Sputtering.
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In : Reactive Sputter Deposition, édité par DEPLA (D.) et MAHIEU (S.), Springer Series in Materials Science, Springer, p. 153-197 (2008).
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