4. General metrological outlook
The sensitivity and resolution of the measurements performed using
the various eSPMs described in this article are relatively well mastered,
and are sufficient in a large number of applications to image variations
in a local quantity, or to carry out spectroscopy with sufficient
contrast and accuracy. What's more, the continuous improvements made
to these devices by their manufacturers ensure that they remain as
close as possible to the needs required by industrial or academic
players involved in research and development activities in micro and
nanoelectronics. The practical limitation of these devices currently
lies rather in the fact that, with the exception of certain eSPMs
such as...
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General metrological outlook
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(2) - WASER (R.), DITTMANN (R.), STAIKOV (G.), SZOT (K.) -
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...
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