Depositing nanometric films by radio frequency cathodic sputtering

This article addresses the deposition of nanometric films by radiofrequency sputtering that, until recently, was reserved for use in the aeronautics and space fields. This process is now economically affordable for other industries as diverse as the decoration or biomedical sectors. Firstly, this article addresses low temperature and low pressure discharges: continuous discharge diodes and radio-frequency discharges (discharge excited by high-frequency electric fields). Following the deposition parameters are reviewed: spraying mechanisms, power, pressure as well as the target to substrate distance.