8. Glossary
DCPV, chemical vapor deposition; CVD, dépôt chimique de la phase vapeur
A process for producing solids by gas-solid reaction using a precursor gas and a solid substrate at a sufficiently high temperature. The many variants of CVD include :
PECVD: plasma-enhanced CVD; the gas phase is replaced by a plasma phase, which significantly reduces the working temperature;
LCVD: laser-CVD; the energy input is localized by the laser, making it possible to localize deposits for rapid prototyping (3D printing), for example;
FBCVD: fluidized-bed CVD: the substrate is a powder, stirred by gas to prevent agglomeration;
CVI: chemical vapor infiltration; the substrate is porous, and deposition takes place at depth in this pore space;
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