ALD's contribution to water photodissociation
Using ALD for photoelectrolysis of water
Article REF: RE258 V1
ALD's contribution to water photodissociation
Using ALD for photoelectrolysis of water

Author : Lionel SANTINACCI

Publication date: October 10, 2016 | Lire en français

Logo Techniques de l'Ingenieur You do not have access to this resource.
Request your free trial access! Free trial

Already subscribed?

2. ALD's contribution to water photodissociation

The main issues concerning photoelectric cells were described in the previous paragraph. While the synthesis of new electrode materials appears to be an option, it is the nanostructuring and functionalization of photoelectrodes that appear to offer the most promising solutions. Thanks to its many advantages over other deposition methods [RE253] , the ALD process is the ideal tool for creating the next generation of photoelectrochemical cells. Indeed, since the early 2010s, ALD has been successfully employed for the synthesis of active or passive films on planar and three-dimensional substrates. Active...

You do not have access to this resource.
Logo Techniques de l'Ingenieur

Exclusive to subscribers. 97% yet to be discovered!

You do not have access to this resource. Click here to request your free trial access!

Already subscribed?


Ongoing reading
ALD's contribution to water photodissociation

Article included in this offer

"Nanosciences and nanotechnologies"

( 135 articles )

Complete knowledge base

Updated and enriched with articles validated by our scientific committees

Services

A set of exclusive tools to complement the resources

View offer details