Optical lithography: issues and challenges
Near-field nanophotolithography
Article REF: NM556 V1
Optical lithography: issues and challenges
Near-field nanophotolithography

Author : Renaud BACHELOT

Publication date: October 10, 2007 | Lire en français

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2. Optical lithography: issues and challenges

Optical lithography, also known as photolithography, is indisputably the main method for mass-producing microelectronics circuits. It involves etching the patterns to be reproduced (circuits) onto a photosensitive polymer. This polymer pattern is then transferred to the silicon wafer on which the thin polymer layer has been deposited. Since the 1970s, this technique has undergone a number of evolutions, described in detail in reference . These developments have involved :

  • the wavelength of light ;

  • photosensitive...

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Optical lithography: issues and challenges

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