5. Conclusion

Pulsed laser ablation deposition is a well-established and common technique in materials laboratories, historically dedicated to the manufacture of complex oxide thin films. However, it is still only rarely used in industry, compared with other techniques such as sputtering or CVD. The crucial question of the size of the deposition surface, which has long been a stumbling block to industrialization, has already been resolved in pilot systems, which are not yet widespread in research laboratories. Deposits of high structural quality can be obtained quite easily. The major drawback of the technique remains debris and droplets on the film surface. Although several solutions exist to remedy this drawback, they are not yet widespread. PLD enables rapid exploration of new materials, often offering congruent deposition and few deposition parameters to adjust, making it a unique process in the world...