2. PEALD
In this chapter, we present the different plasma reactors used in PEALD, and then give a number of examples of the impact of plasma assistance on the properties of the thin films produced.
2.1 Reactors
There are 3 types of plasma reactor to support ALD. Two use an inductive source, while the third uses a capacitive source.
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Radical Enhanced ALD
This type of reactor uses a remote plasma source. This plasma is generally created from an inductive (13.56 MHz, for example) or microwave (2.45 GHz) source. This plasma is offset to avoid any direct contact between the plasma and the substrate. The fact that charged particles in a plasma have a smaller mean free path than radicals is used to ensure...
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PEALD
Conclusion
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