Overview
ABSTRACT
This article is a review of the use of atomic layer deposition (ALD) in the microelectronics domain for the development of thin films and producing components. Applications, chemical precursors, growth mechanisms and reactor types (with or without plasma assistance) are described.
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Read the articleAUTHORS
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Mickael GROS-JEAN : Research and Development Engineer - STMicroelectronics, Crolles, France
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Arnaud MANTOUX : Teacher-researcher - Materials and Processes Science and Engineering Laboratory (SIMaP) - Grenoble-INP, CNRS, Université Grenoble Alpes, Grenoble, France
INTRODUCTION
ALD is a relatively latecomer to microelectronics, having been introduced in integrated circuit manufacturing units in the early 2000s. The main advantage of ALD is its ability to manufacture very thin films with excellent control over thickness, chemical composition and microstructure, whether on flat surfaces or complex topographies. What's more, thanks to its surface saturation principle, ALD is not sensitive to local consumption, as is the case with the CVD technique, which can lead to differences in deposited thickness depending on pattern density. Finally, the deposition temperature is generally lower than with CVD, often well below 400°C, making it compatible with fragile underlying stacks.
This article presents the various applications of ALD in the microelectronics industry, in chronological order of introduction into production units. The various types of equipment used are then described, with a presentation of the different solutions for improving process profitability, a crucial parameter in this mature industry today.
Field: ALD, thin films, microelectronics
Degree of technology diffusion: Growth
Technologies involved: Thin films in microelectronics
Applications: Microelectronics
Main French players :
Competence centers: CEA – Leti
Industrial: STMicroelectronics
Other global players: Intel, Samsung, TSMC, Micron, Imec, Infineon, NXP
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KEYWORDS
DRAM memories | MIM capacities | HKMG transistors | PEALD process
ALD in Microelectronic. Applications, Equipments and Productivity
DRAM memories
Bibliography
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