Glossary
Atomic Layer Deposition (ALD)

Add to my library

RE253 V2 Article

Glossary
Atomic Layer Deposition (ALD)

Authors : Nathanaelle SCHNEIDER, Élisabeth BLANQUET

Publication date: July 10, 2026 | Lire en français

Add to my library Add to my library

Logo Techniques de l'Ingenieur You do not have access to this resource.
Request your free trial access! Free trial

Already subscribed?

6. Glossary

ALD; ALD (Atomic Layer Deposition)

An alternating-flow chemical vapor deposition technique based on self-limiting surface reactions. This allows for precise control of film thickness and composition, and enables the achievement of specific characteristics (uniformity, conformality).

Adsorption; adsorption

A term describing the interaction between a gaseous or liquid species (adsorbate) and a surface (adsorbent). It can be physical (physisorption) or chemical (chemisorption).

ALD window; ALD window

The temperature range within which the deposition rate is constant and growth occurs via the ALD mechanism.

SCROLL TO TOP...
You do not have access to this resource.
Logo Techniques de l'Ingenieur

Exclusive to subscribers. 97% yet to be discovered!

You do not have access to this resource. Click here to request your free trial access!

Already subscribed?


Article included in this offer

"Technological innovations"

( 196 articles )

Complete knowledge base

Updated and enriched with articles validated by our scientific committees

Services

A set of exclusive tools to complement the resources

View offer details
Contact us