Classic techniques
Laser selective surface metallization

CVD (Chemical Vapor Deposition) is a gas-phase thin-film deposition technique in which gaseous precursors interact with the substrate surface, either by reaction or decomposition, to form the desired metallic thin-film. The use of RF-generated plasma in this procedure directly activates both the substrate surface and the metal precursor gases that will create the thin film.

Combined with plasma to improve performance, this technique...