Cold plasma
Plasma Enhanced Atomic Layer Deposition
Research and innovation REF: RE260 V1
Cold plasma
Plasma Enhanced Atomic Layer Deposition

Author : Christophe VALLEE

Publication date: October 10, 2016 | Lire en français

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1. Cold plasma

The aim of this first section is to describe the cold plasmas used in PEALD processes. We will give a definition of cold plasmas and the quantities used to characterize them. For a more detailed description, please refer to the article by Anne-Marie Pointu et al in Techniques de l'ingénieur .

1.1 Definition of cold plasma

The term "plasma" was proposed by Langmuir in 1929 to describe an ionized gas. More rigorously, plasma can be defined as a quasi-neutral gas made up of charged...

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