Research and innovation | REF: RE262 V1

Spatial Atomic Layer Deposition (SALD)

Author: David MUÑOZ-ROJAS

Publication date: November 10, 2016 | Lire en français

You do not have access to this resource.
Click here to request your free trial access!

Already subscribed? Log in!

Automatically translated using artificial intelligence technology (Note that only the original version is binding) > find out more.

    A  |  A

    2. Keeping precursors separate: SALD frames

    The spatial approach has proved to be very versatile from a technical point of view since many reactors have been listed to date. S. Nonobe et al. proposed a horizontal quartz space reactor (see figure 1 in ) for the growth of HfO 2 films on 10 mm × 10 mm silicon substrates

    You do not have access to this resource.

    Exclusive to subscribers. 97% yet to be discovered!

    You do not have access to this resource.
    Click here to request your free trial access!

    Already subscribed? Log in!


    The Ultimate Scientific and Technical Reference

    A Comprehensive Knowledge Base, with over 1,200 authors and 100 scientific advisors
    + More than 10,000 articles and 1,000 how-to sheets, over 800 new or updated articles every year
    From design to prototyping, right through to industrialization, the reference for securing the development of your industrial projects

    This article is included in

    Nanosciences and nanotechnologies

    This offer includes:

    Knowledge Base

    Updated and enriched with articles validated by our scientific committees

    Services

    A set of exclusive tools to complement the resources

    Practical Path

    Operational and didactic, to guarantee the acquisition of transversal skills

    Doc & Quiz

    Interactive articles with quizzes, for constructive reading

    Subscribe now!

    Ongoing reading
    Keeping precursors separate: SALD frames