SALD vs ALD
Spatial Atomic Layer Deposition (SALD)
Research and innovation REF: RE262 V1
SALD vs ALD
Spatial Atomic Layer Deposition (SALD)

Author : David MUÑOZ-ROJAS

Publication date: November 10, 2016 | Lire en français

Logo Techniques de l'Ingenieur You do not have access to this resource.
Request your free trial access! Free trial

Already subscribed?

1. SALD vs ALD

The ALD technique was patented in 1977 by T. Suntola . In this first patent, both temporal and spatial approaches had already been proposed. In the first case, precursors are injected in consecutive injections separated by purging steps (and therefore separated in time). In the second, the precursors are supplied continuously at different locations, and it is the substrate that moves from one location to another (so the precursors are deposited spatially separated, see figure

You do not have access to this resource.
Logo Techniques de l'Ingenieur

Exclusive to subscribers. 97% yet to be discovered!

You do not have access to this resource. Click here to request your free trial access!

Already subscribed?


Article included in this offer

"Nanosciences and nanotechnologies"

( 135 articles )

Complete knowledge base

Updated and enriched with articles validated by our scientific committees

Services

A set of exclusive tools to complement the resources

View offer details