Glossary

ALD; atomic layer deposition

Atomic layer deposition. Chemical vapor deposition process. Based on sequential exposure of the substrate to two (or more) precursors, this technique enables uniformly three-dimensional structures to be covered.

APCVD; atmospheric pressure chemical vapor deposition

Chemical vapor deposition at atmospheric pressure.

CVD; chemical vapor deposition

Chemical Vapor Deposition. A method of depositing thin films from chemical precursors in a vacuum. Unlike ALD, in CVD the precursor chemicals are injected simultaneously and react together on the surface.

FTO ;fluorine tin oxide

Fluorine-doped tin oxide. Transparent, conductive material used in dye-sensitized photovoltaic cells.

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