4. General metrological outlook

4.1 Better control uncertainties and improve the metrological quality of measurement at this scale

The sensitivity and resolution of the measurements performed using the various eSPMs described in this article are relatively well mastered, and are sufficient in a large number of applications to image variations in a local quantity, or to carry out spectroscopy with sufficient contrast and accuracy. What's more, the continuous improvements made to these devices by their manufacturers ensure that they remain as close as possible to the needs required by industrial or academic players involved in research and development activities in micro and nanoelectronics. The practical limitation of these devices currently lies rather in the fact that, with the exception of certain eSPMs such as...