3. Reactor architectures

In this section, we'll look at the different reactor architectures that have been able to achieve the nanoscopic conditions required for an ALD process in a R&D or plant environment. Two major approaches can be distinguished: one has a substrate remaining in place during deposition, and moving gases. This approach is called temporal ALD. The second approach has a stationary gas and a moving substrate. This approach is called spatial ALD. Spatial ALD will be discussed in detail in [ RE262 ].