Context
Input of In situ characterisation in atomic layer deposition (ALD) processes.

Add to my library

RE263 V1 Research and innovation

Context


Input of In situ characterisation in atomic layer deposition (ALD) processes.

Authors : Jean-Luc DESCHANVRES, Carmen JIMENEZ

Publication date: October 10, 2016 | Lire en français

Add to my library Add to my library

Logo Techniques de l'Ingenieur You do not have access to this resource.
Request your free trial access! Free trial

Already subscribed?

1. Context

As with all development methods, optimizing the desired properties of an ALD-developed functional material is necessarily linked to mastery of the development process. This control can be acquired following a large number of growth experiments analyzed by ex situ and a posteriori techniques. Another way of meeting this demand is to analyze in situ the species created in the gas phase and compare them with thermodynamic calculations [RE252] . The ability to carry out in situ analyses during the growth process provides access to new information and reduces development times. With this in...

You do not have access to this resource.
Logo Techniques de l'Ingenieur

Exclusive to subscribers. 97% yet to be discovered!

You do not have access to this resource. Click here to request your free trial access!

Already subscribed?


Article included in this offer

"Technological innovations"

( 190 articles )

Complete knowledge base

Updated and enriched with articles validated by our scientific committees

Services

A set of exclusive tools to complement the resources

View offer details

Dans les ressources documentaires

Faisceaux d’ions - Applications

Les faisceaux d’ions permettent de nombreuses applications dans divers domaines. Par exemple, l’implantat...

Pulvérisation cathodique magnétron

Cet article détaille le procédé de pulvérisation cathodique magnétron, procédé qui associe l’effet thermi...

Fonctionnalisation de surface par laser ultrarapide - Applications et voies vers l’industrialisation

Depuis sa naissance en 1985, le laser ultracourt de haute puissance (HP) est passé d'un simple concept pr...

Dépôt par ablation laser pulsé

Cet article est une revue de la technique de dépôt en couche mince par ablation laser pulsé ou  Puls...

Tous les livres blancs
Toutes les actualités
Contact us