Description
Dépôts ioniques

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M1663 V1 Archive

Description
Dépôts ioniques

Author : Jean MACHET

Publication date: January 10, 1986 | Lire en français

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1. Description

The simplest experimental set-up is shown in figure 1 . The material to be deposited is evaporated in the N pod, which is heated by the Joule effect. The substrates S are placed under the cathode electrode C, which is negatively polarized in relation to the rest of the grounded enclosure. The introduction of a gas raises the pressure in the chamber and initiates an electrical discharge between the substrate-carrying cathode and the rest of the chamber. For metal deposition, the gas used is argon. If a composite material is to be deposited, the gas(es) corresponding to the material is introduced.

Example

to obtain titanium nitride, titanium is evaporated in the presence of a discharge carried out in nitrogen or in an argon-nitrogen...

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