Conclusion
Atomic layer deposition for photovoltaics

ALD has established itself as a mature technology in the field of photovoltaics. Industrially, it is already being adopted for PERC technology, is well-suited for TOPCon cells, and is positioning itself as a key solution for future tandem architectures. On a more exploratory level, ALD’s ability to deposit high-quality thin films—with extremely precise control over composition and thickness, uniformity over large areas, and excellent conformality—makes it an indispensable tool for the development of new solar cell architectures. It is used for various applications, leveraging all the latest technical advances such as high-throughput, selective, or hybrid organic-inorganic approaches. As the community regularly emphasizes at workshops, conferences, and industry meetings, the closer we get to the theoretical limits of efficiency, the more crucial the atomic-scale control offered by ALD becomes....