ALD: Principles, Characteristics, Applications, and Challenges for PV
Atomic layer deposition for photovoltaics

ALD, through its clean growth mechanism (sequential, self-limiting surface chemical reactions), enables the deposition of thin films with unique properties (atomic-scale control of film composition and thickness, conformal and uniform) at low temperatures over large areas (on the order of square meters). As a result, ALD-deposited functional materials have a wide range of applications in both laboratory settings and the PV industry.

Here we highlight a few key aspects of ALD growth and the resulting films, which are discussed in greater detail in other articles.