Atomic layer deposition for photovoltaics

Overview

ABSTRACT

This article presents the applications of Atomic Layer Deposition (ALD) in the field of photovoltaics (PV). After a brief overview of PV conversion, the main PV technologies and their challenges, the specific features of the ALD technique will be detailed, highlighting its assets for PV, such as the ability to deposit uniform, conformal thin films with atomic-scale control over thickness and film composition under mild conditions. Finally, a selection of application examples is presented to illustrate these benefits, as well as the associated challenges and limitations.

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AUTHORS

Nathanaelle SCHNEIDER : Research Director at the CNRS, Ph.D. in Chemistry from the Universities of Strasbourg and Heidelberg - Ile-de-France Photovoltaics Institute (IPVF), UMR 9006 CNRS, École Polytechnique – IP Paris, Chimie Paristech – PSL, Palaiseau, France
Virginie BRIZE : Research Engineer at the CEA, Ph.D. in Materials Chemistry from the University of Tours - University of Grenoble Alpes, CEA, LITEN, INES Campus, Le Bourget du Lac, France

INTRODUCTION

Photovoltaic (PV) conversion is an essential component of the energy mix and is experiencing rapid growth, driven by falling costs, supportive policies, and technological advances. This article analyzes the contribution of the ALD (Atomic Layer Deposition) technique to this field.

ALD is a chemical vapor deposition technique that enables the growth of ultra-thin, uniform, conformal layers with sub-nanometer thickness. ALD applications for photovoltaics are diverse, with varying levels of maturity, ranging from the passivation of industrial silicon cells to innovative new architectures.

This article presents the main applications of ALD in photovoltaics, both in research laboratories and at the industrial production scale, and discusses its advantages and limitations in a field where any innovation must meet strict constraints regarding cost, dimensions, long-term stability, and high production rates.

Key Points

Field: Thin-film deposition techniques

Technology maturity level: mature

Technologies involved: atomic layer deposition (ALD)

Application areas: photovoltaics

Major French players:

– Centers of expertise: CEA, CNRS, ITE-IPVF, ITE-INES.2S, universities;

– Industrial companies: Encapsulix, Héliup, IPVF SAS, Voltec Solar.

Other global players:

Applied Materials, ASM, Beneq Oy, Jusung Engineering Co. Ltd., Intel, Lam Research, Oxford Instruments, Samsung, Tokyo Electron Limited, Ultratech/Cambridge Nanotech, Veeco Instruments Inc. 3SUN, First Solar, Hanwha-Q-cells, JA Solar, Jinko Solar, Kaneka, Leadmicro, LONGi, Oxford PV, Renshine, Trina Solar;

Argonne National Laboratory, CSEM, École Polytechnique Fédérale de Lausanne, Eindhoven University, Fraunhofer Institute for Solar Energy Systems, HZB, KAIST, KAUST, Nanyang University, Stanford University, Yonsei University, UNSW.

Contact:

[email protected] , [email protected]

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KEYWORDS

photovoltaics | ALD | interface engineering

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