Near-field nanophotolithography

Add to my library

NM556 V1 Article

Near-field nanophotolithography

Author : Renaud BACHELOT

Publication date: October 10, 2007 | Lire en français

Add to my library Add to my library

Logo Techniques de l'Ingenieur You do not have access to this resource.
Request your free trial access! Free trial

Already subscribed?

Overview

ABSTRACT

The use of nano-sources to induce a photostructure transformation of matter in a controlled manner, with a resolution much lower than the wavelength of light, paves the way for a promising approach to nanolithography which uses photons as a writing medium. The targeted applications go well beyond the field of microelectronics since they involve both high-density optical storage and molecular manipulation.

Read this article from a comprehensive knowledge base, updated and supplemented with articles reviewed by scientific committees.

Read the article

 INTRODUCTION

Exploiting nanosources to photostructure matter in a controlled way with a resolution well below the wavelength of light, opens the way to a promising approach to nanolithography using photons as writing vectors.

You do not have access to this resource.
Logo Techniques de l'Ingenieur

Exclusive to subscribers. 97% yet to be discovered!

You do not have access to this resource. Click here to request your free trial access!

Already subscribed?


Ongoing reading
Near-field nanophotolithography

Article included in this offer

"Nanosciences and nanotechnologies"

( 137 articles )

Complete knowledge base

Updated and enriched with articles validated by our scientific committees

Services

A set of exclusive tools to complement the resources

View offer details

Contenus associés

Sur le même sujet

Veille personnalisée : Inscrivez-vous !
Contact us