References
Near-field nanophotolithography
Article REF: NM556 V1
References
Near-field nanophotolithography

Author : Renaud BACHELOT

Publication date: October 10, 2007

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6. 

Bulletin MRS (Materials Research Society) Fabrication of sub-45 nm structures for the next generation of devices. Vol. 30, n˚ 12, déc. 2005. RONSE (K.) Optical lithography – a historical perspective. C. R. Physique, doi : 10.1016/j.chry.2006.10.007 (2006). SWITKES (M.) ROTHSCHILD (M.) KUNZ (R.R.) BAEK (S.-Y.) COLES (D.) YEUNG (M.) Immersion lithography : Beyond the 65 nm node with optics. Microlithography World, p. 4, mai 2003. COURJON (D.) Near-field microscopy and near-field optics. Imperial College Press, Londre (2003). NOVOTNY (L.) HECHT (B.) Principles of Nanooptics....
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