Near-field nanophotolithography
Article REF: NM556 V1

Near-field nanophotolithography

Author : Renaud BACHELOT

Publication date: October 10, 2007 | Lire en français

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ABSTRACT

The use of nano-sources to induce a photostructure transformation of matter in a controlled manner, with a resolution much lower than the wavelength of light, paves the way for a promising approach to nanolithography which uses photons as a writing medium. The targeted applications go well beyond the field of microelectronics since they involve both high-density optical storage and molecular manipulation.

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 INTRODUCTION

Exploiting nanosources to photostructure matter in a controlled way with a resolution well below the wavelength of light, opens the way to a promising approach to nanolithography using photons as writing vectors.

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