Research and innovation | REF: RE261 V1

Thin film barriers by ALD for OLED and microbatteries

Authors: Tony MAINDRON, Messaoud BEDJAOUI

Publication date: October 10, 2016 | Lire en français

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    Overview

    ABSTRACT

    One of the major problems with organic light-emitting diodes (OLEDs) and microbatteries lies in their rapid degradation when in contact with oxidising gases in the atmosphere, water and oxygen. Efficient encapsulation processes are therefore needed to achieve sufficient reliability and lifetime. To overcome these problems, new encapsulation processes have been developed to achieve reliable, low-cost, flexible, conformable and less brittle products. The atomic layer deposition (ALD) technology is one of the most promising ways to achieve high quality barrier layers to protect these devices.

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    AUTHORS

    • Tony MAINDRON: CEA-LETI researcher - MINATEC Campus-Univ. Grenoble Alpes, 17 rue des Martyrs, Grenoble, France.

    • Messaoud BEDJAOUI: CEA-LETI researcher - MINATEC Campus-Univ. Grenoble Alpes, 17 rue des Martyrs, Grenoble, France.

     INTRODUCTION

    Thin-film circuits have a wide range of applications today, in all areas of microelectronics: OLEDs (Organic Light Emitting Diodes) for display and lighting, OPVs (Organic PhotoVoltaics) for solar energy recovery, OPDs (Organic PhotoDiodes) for photodetection, OTFTs (Organic Thin Film Transistors) for electronics, and microbatteries for energy storage. Whatever the targeted device, based on the integration of organic or inorganic semiconductors, one of the major problems lies in the high sensitivity of the components to the breathable atmosphere, particularly to oxygen and water vapour.

    The encapsulation of commercial products is achieved using glass covers hermetically sealed under inert gas around the devices by means of laser glass sintering. However, this solution has a number of shortcomings, such as cost, process logic and loss of flexibility. Technologies employing gas-barrier thin films have therefore been developed to replace rigid covers. ALD technology is one of the technologies enabling very high barrier levels to be achieved, characterized by very low WVTR (Water Vapour Transmission Rates). This article describes the application of ALD technology to the encapsulation of OLED devices, followed by microbatteries. The specific features of each electronic device will be discussed.

    A table of acronyms is provided at the end of the article.

    Key points

    Field: Display technologies and power generation

    Degree of technology diffusion: Growth

    Technologies involved: OLED, Microbatteries, Thin films, ALD

    Applications: Display, Lighting, Energy

    Main French players :

    • Competitive clusters: Minalogic

    • Competence centers: CEA-LETI

    • Manufacturers: MicroOLED, Astron-Fiamm Safety, ST MicroElectronics

    Other players worldwide :

    Samsung, LG, Merck, Panasonic, Novaled, Sumitomo, Universal Display Corporation, Osram, Konica Minolta, Sony

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    KEYWORDS

    lithium microbatteries   |   ultra-high barrier   |   atomic layer deposition


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