General principle of ALD
Atomic Layer Deposition (ALD)
Research and innovation REF: RE253 V1
General principle of ALD
Atomic Layer Deposition (ALD)

Authors : Nathanaelle SCHNEIDER, Frédérique DONSANTI

Publication date: October 10, 2016 | Lire en français

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2. General principle of ALD

2.1 ALD basics

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2.1.1 Chemical Vapor Deposition

ALD is a recent variation on a technique developed as far back as the 1920s, Chemical Vapor Deposition (CVD) . In a CVD process, the interaction between...

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