Effect of cathode electromagnetic field on plasma properties
Bipolar high-power impulse magnetron sputtering
Research and innovation REF: IN251 V1
Effect of cathode electromagnetic field on plasma properties
Bipolar high-power impulse magnetron sputtering

Authors : Matthieu MICHIELS, Stephanos KONSTANTINIDIS, Dominique DECKERS

Publication date: September 10, 2023 | Lire en français

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4. Effect of cathode electromagnetic field on plasma properties

It is well known that the properties of thin films are strongly correlated to the energy per deposited atom, as demonstrated by various publications

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