1. Description
The simplest experimental set-up is shown in figure 1 . The material to be deposited is evaporated in the N pod, which is heated by the Joule effect. The substrates S are placed under the cathode electrode C, which is negatively polarized in relation to the rest of the grounded enclosure. The introduction of a gas raises the pressure in the chamber and initiates an electrical discharge between the substrate-carrying cathode and the rest of the chamber. For metal deposition, the gas used is argon. If a composite material is to be deposited, the gas(es) corresponding to the material is introduced.
to obtain titanium nitride, titanium is evaporated in the presence of a discharge carried out in nitrogen or in an argon-nitrogen...
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Description
Deposit characteristics
Bibliography
Specialist articles
Manufacturers. Suppliers
(Non-exhaustive list)
Vacuum equipment and vacuum deposits in general
CIT Alcatel.
Balzers SA.
Eta Electrotech (Sté).
Leybold Heraeus Sogev SA.
As regards ionic deposition in particular, only Balzers, Leybold and Electrotech seem to be working in this field.
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