2. Classic techniques
2.1 Chemical deposition (gas and liquid phase)
CVD (Chemical Vapor Deposition) is a gas-phase thin-film deposition technique in which gaseous precursors interact with the substrate surface, either by reaction or decomposition, to form the desired metallic thin-film. The use of RF-generated plasma in this procedure directly activates both the substrate surface and the metal precursor gases that will create the thin film.
Combined with plasma to improve performance, this technique...
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Classic techniques
Laser-assisted techniques
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Bibliography
- (1) - - Projection thermique métallisation. © Sofiplast – http://www.sofiplast.fr/revetement_projection_thermique.php .
- (2)...
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