2. Classic techniques
2.1 Chemical deposition (gas and liquid phase)
CVD (Chemical Vapor Deposition) is a gas-phase thin-film deposition technique in which gaseous precursors interact with the substrate surface, either by reaction or decomposition, to form the desired metallic thin-film. The use of RF-generated plasma in this procedure directly activates both the substrate surface and the metal precursor gases that will create the thin film.
Combined with plasma to improve performance, this technique...
Exclusive to subscribers. 97% yet to be discovered!
Already subscribed? Log in!
Classic techniques
Laser-assisted techniques
Article included in this offer
"Metal treatments"
(
126 articles
)
Updated and enriched with articles validated by our scientific committees
A set of exclusive tools to complement the resources
Bibliography
- (1) - - Projection thermique métallisation. © Sofiplast – http://www.sofiplast.fr/revetement_projection_thermique.php .
- (2) - - Fonctionnalité...
Exclusive to subscribers. 97% yet to be discovered!
Already subscribed? Log in!
