Choice of manufacturing process
Surface treatments for microelectronics connections
Article REF: M1752 V1
Choice of manufacturing process
Surface treatments for microelectronics connections

Author : Gilles POUPON

Publication date: December 10, 2006, Review date: February 1, 2016 | Lire en français

Logo Techniques de l'Ingenieur You do not have access to this resource.
Request your free trial access! Free trial

Already subscribed?

5. Choice of manufacturing process

In addition to the nature of the alloy to be produced, the choice of material manufacturing process is also conditioned by the size of the microbeads and the pitch of the future interconnections (probably the most important factors). Indeed, depending on whether you want to assemble a processor or an image sensor (several hundred interconnections, a few millimetres on a side and a small interconnection pitch) or a BGA package (a few inputs/outputs with a pitch of several hundred micrometres), the material processing method will differ (figure 14 ).

Most of these processes are "wafer level", meaning that several thousand electrical connections can be made simultaneously on the substrates. Depending on the case, it may be more advantageous to choose a collective (wafer...

You do not have access to this resource.
Logo Techniques de l'Ingenieur

Exclusive to subscribers. 97% yet to be discovered!

You do not have access to this resource. Click here to request your free trial access!

Already subscribed?


Ongoing reading
Choice of manufacturing process

Article included in this offer

"Metal treatments"

( 126 articles )

Complete knowledge base

Updated and enriched with articles validated by our scientific committees

Services

A set of exclusive tools to complement the resources

View offer details
Contact us