7. Glossary
CVD (Chemical Vapor Deposition) and MOCVD (Metal-Organic Chemical Vapor Deposition)
Chemical vapor deposition: reaction between a volatile precursor (e.g. an organometallic) and a gas to produce a deposit on a substrate.
RAP (Reactive Atmosphere Processing)
Technique for purifying chemical compounds (e.g. removing oxides and hydroxides from fluorides) by reacting impurities with reactive atmosphere gases.
EBS (Electron Beam Sputtering)
Physical vapor deposition technique in which a target anode is bombarded by an electron beam.
PLD (Pulsed Laser Deposition)
Thin-film deposition method using laser pulses of very high peak power.
PVD (Physical Vapor Deposition)
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