Overview
ABSTRACT
This article, dedicated to the Raman diffusion spectroscopy applied to extreme conditions, presents the state-of-the-art Raman instrumentation and methodology through the latest technological developments. The issues related to extreme conditions are also discussed. Examples of applications in hostile environments (structural relaxation of silicon during annealing, followed by the in-situ alteration of uranium dioxide by radiolysis) illustrate the subject matter.
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Read the articleAUTHORS
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Aurélien CANIZARES : Spectroscopic development engineer Laboratoire CEMHTI (Conditions extrêmes et matériaux : haute température et irradiation), UPR3079 CNRS
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Patrick SIMON : Research Director, Laboratoire CEMHTI UPR3079 CNRS
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Guillaume GUIMBRETIERE : Research Associate CEMHTI Laboratory UPR3079 CNRS
INTRODUCTION
Field: analytical techniques
Degree of technology diffusion: Emergence | Growth | Maturity
Technologies involved: Raman scattering spectroscopy, particle gas pedal, cyclotron
Applications: materials, nuclear, geology, high temperatures
Main French players :
Manufacturers: Renishaw, Horiba Jobin Yvon, Andor Technology, Bruker Corp, Jasco, Thermo Scientific, BW Tech, BaySpec, Kaiser Optical System
Other players worldwide :
Contact: [email protected]
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Raman diffusion spectrometry under extreme conditions
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