Conclusion
Atomic layer deposition for photovoltaics
Research and innovation REF: RE257 V1
Conclusion
Atomic layer deposition for photovoltaics

Authors : Danièle BLANC PELISSIER, Nathanaelle SCHNEIDER

Publication date: November 10, 2016 | Lire en français

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4. Conclusion

In view of the large number of publications and recent industrial developments, it is clear that ALD is now a well-established technology in the photovoltaic community. From an industrial point of view, with PERC technology on silicon set to take an important place on the market, the performance of alumina passivation layers deposited by ALD and the development of specific reactors open up new commercial applications for ALD. From a more exploratory point of view, ALD's ability to deposit thin films of excellent quality, with extremely precise thickness control, uniformity over large dimensions and coverage, is an undeniable asset for the development of new solar cell architectures.

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