4. Conclusion

The integration of NTCs into various devices requires nanoscale control of growth (number of walls, chirality, etc.), patterning, and, above all, a reduction in synthesis temperature. Most current processes, such as electric arc, laser ablation, and CVD (chemical vapor deposition), generally allow for the synthesis of large quantities of NTCs, but with low selectivity between the different phases of the deposited carbon. On the other hand, mixed processes from the CVD family seem to be best suited for in situ integration, which avoids additional purification and handling steps. Plasma processes are therefore very much present in the nanotechnology race.