Low pressure, low temperature discharge
Radiofrequency cathodic sputtering deposition of nanometric films
Article REF: NM610 V1
Low pressure, low temperature discharge
Radiofrequency cathodic sputtering deposition of nanometric films

Author : Gilles RENOU

Publication date: April 10, 2006 | Lire en français

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2. Low pressure, low temperature discharge

2.1 Diode discharge

To create a discharge in a gas between two conductive plates, the electrical rigidity of the medium must be overcome by applying a strong electric field up to an ignition voltage V b . This potential V b depends on the gas and the product of pressure × distance between electrodes.

The function V b = f (p × d) is represented by Paschen curves (Figure 1 ). These curves are unique for each gas since they depend on the ionization ease of the element, and...

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