Presentation
Radiofrequency cathodic sputtering deposition of nanometric films
Article REF: NM610 V1
Presentation
Radiofrequency cathodic sputtering deposition of nanometric films

Author : Gilles RENOU

Publication date: April 10, 2006 | Lire en français

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1. Presentation

Gilles RENOU is a materials development engineer at the nanometric environments research laboratory, University of Évry.

We will focus on low-temperature, low-pressure discharges. We will concentrate on the specific characteristics of discharges excited by high-frequency electric fields, which are a very special case of these plasmas. These are commonly referred to as radio frequency discharges, and the frequency used is often 13.56 MHz. The most commonly used plasma gas is argon due to its chemical neutrality (rare gas), relatively high mass (M = 40), and low cost compared to other neutral gases.

These low-temperature, low-pressure discharges, often referred to as cold plasmas, are characterized by a degree of ionization α=nene+n0...

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