Radiofrequency cathodic sputtering deposition of nanometric films
Article REF: NM610 V1

Radiofrequency cathodic sputtering deposition of nanometric films

Author : Gilles RENOU

Publication date: April 10, 2006 | Lire en français

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AUTHOR

  • Gilles RENOU

 INTRODUCTION

The deposition of thin layers ranging from a few tens of nanometers to a few micrometers using physical vapor deposition (PVD) was once reserved for the aerospace industry. While this process is still widely used in mechanical engineering, it is now economically viable for other sectors as diverse as decoration and biomedicine. Most sputtering deposition machines operate using magnetron diodes. However, in certain cases, particularly when using insulating targets, the use of a radio frequency system is essential.

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Radiofrequency cathodic sputtering deposition of nanometric films

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