Study of reaction mechanisms
Input of In situ characterisation in atomic layer deposition (ALD) processes.
Research and innovation REF: RE263 V1
Study of reaction mechanisms
Input of In situ characterisation in atomic layer deposition (ALD) processes.

Authors : Jean-Luc DESCHANVRES, Carmen JIMENEZ

Publication date: October 10, 2016 | Lire en français

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3. Study of reaction mechanisms

Determining the reaction mechanisms that give rise to material growth during the ALD process requires analysis of both the gas and solid phases. As presented in the article Thermodynamic evaluation of ALD precursors [RE252] , thermodynamics is a very interesting tool for the choice of precursors and deposition parameters. Determining thermodynamic quantities requires experimental set-ups specific to gas-phase characterization, although the measurement techniques are the same as those presented in this article (mass spectroscopy, FTIR, etc.). In this section, we will confine ourselves...

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