Applications of these techniques to characterize nanostructured devices or nanosystems

In the microelectronics industry, the need for local measurements, i.e. as close as possible to the elementary component, has arisen as dimensions have continued to shrink. This is true for a large part of metrology, and in particular for electrical measurements. Process control is based on a very large number of measurements which are carried out in test structures adapted to the parameter to be quantified and with a size of a few tens of micrometers on a side. They are located in the cutting lines between chips. This measurement strategy is not satisfactory in all cases, for two reasons. The first is the distance of these structures from the chip, which generates biased measurements in relation to the active component due to the intrinsic dispersion of physico-chemical...